Indium Corporation Launches New Indium Oxide

Indium Corporation has released IndiOx™ (In2O3) for use in the manufacture of ITO sputtering targets for thin-film coating. IndiOx™ (In2O3) is a stable ceramic-like material that is insoluble in water and volatizes at 850°C.

When doped with tin oxide, IndiOx™ forms ITO, the material of choice to form transparent conductive oxide (TCO) layers in flat-panel displays and touch sensors for mobile devices. The ITO layer is deposited onto glass from a sputtering target that is manufactured from the ITO powder by sintering.

Other uses for IndiOx™ include glass coloring, gassing suppression in alkaline batteries, and as an anti-arcing additive in high current electrical switches and contactors.

IndiOx™ is available in three powder types:

  • Type A – Crystalline: particle size distribution D10–D90 ranges from 0.8–38μm.
  • Type B – Fine: particle size distribution D10–D90 ranges from 0.5–6μm.
  • Type T – Target Grade: particle size distribution D10–D90 ranges from 0.1–7.5μm. The primary particle size is about 100nm.

For more information about Indium Corporation’s suite of compound materials, visit www.indium.com/indiox.

Indium Corporation is a premier materials manufacturer and supplier to the global electronics, semiconductor, thin-film, and thermal management markets. Products include solders and fluxes; brazes; thermal interface materials; sputtering targets; indium, gallium, germanium, and tin metals and inorganic compounds; and NanoFoil®. Founded in 1934, the company has global technical support and factories located in China, India, Malaysia, Singapore, South Korea, the United Kingdom, and the USA.

Hordon Kim, hordon@powerelectronics.co.kr

 

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